Invitation

Ion implantation beyond the 1st monolayer up to several µm is a versatile method. It is situated at the junction between plasma physics, ion-solid interaction, surface physics and solid state physics. Modern applications include – among others – shallow junctions and functional surfaces. In combination with ion assisted deposition processes, sophistically tailored coatings are possible.

At the same time, ion extraction and implantation directly from a plasma allows additional control parameters. Thus, it is a flexible and effective method for modifying large surfaces even of complex geometries. Beside fundamental investigations, many applications in the laboratory scale and even in industry are currently under development.

The objective of the 9th International Workshop on Plasma Based Ion Implantation and Deposition (PBII&D 2007) is to provide a fruitful platform for cross-disciplinary exchange of the latest scientific results in this area. The workshop takes place on September 2^nd to 6^th 2007 in Leipzig, Germany in the new-build KUBUS conference center at the Science Park Leipzig.

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