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Programmlast change: August 15th Session 1: Plasma-based implantation and deposition 09:00
WELCOME
Welcome Adress by Ministerialrat Dr. Uhlmann Saxonian Ministry of Science and the Fine Arts 09:15
[I-1-1] PHYSICS OF HIGH POWER IMPULSE MAGNETRON SPUTTERING AND PLASMA-BASED ION IMPLANTATION & DEPOSITION: A COMPARISON
Andre Anders 10:00
[O-1-1] N, C, TA TERNARY PLASMA BASE IONS IMPLANTATION AND DEPOSITION ON GCR15 STEEL
GuangZe Tang 10:15
[O-1-2] PRODUCTION OF NITROGEN-CONTAINING CARBON PLASMA USING SHUNTING ARC DISCHARGE FOR CARBON NITRIDE FILMS PREPARATION
Koichi Takaki, Keigo Imanishi, Takayuki Murakami, Seiji Mukaigawa, Tamiya Fujiwara, Yoshiyuki Suda, Ken Yukimura 10:30
[O-1-3] PLASMA ION IMPLANTATION AND DEPOSITION OF ALUMINIUM ON HIGH TEMPERATURE OXIDATION CHARACTERISTICS OF TITANIUM BASE ALLOYS
Injeti Gurrappa, Darina Manova, Jürgen Gerlach, Stephan Mändl, Bernd Rauschenbach 10:45
COFFEE BREAK
Session 2: PBII Systems 11:15
[I-2-1] FUNDAMENTAL PLASMA PHENOMENA & DELIVERED ION DOSE IN PBII
Michael P Bradley 12:00
[O-2-1] MODERN DC AND MF POWER SUPPLIES TO ENABLE PROGRESSIVE PLASMA BASED DEPOSITION
Dirk Ochs 12:15
[O-2-2] MODEL-4 PIIID FACILITY FOR A HYBRID PROCESS AND COMMERCIAL APPLICATIONS
Langping Wang, Lei Huang, Zhiwen Xie, Xiaofeng Wang, Baoyin Tang 12:30
[O-2-3] DUAL-PLASMA ION PROCESS FOR CHARGING-FREE, ION-ASSISTED TREATMENT OF INSULATORS
Takashi Ikehata, Yuya Nonaka, Sunao Ishizuka, Naoyuki Sato, Ken Yukimura 12:45
LUNCH BREAK
Session 3: Plasma Diagnostics 14:00
[I-3-1] PLASMA CHARACTERIZATION BY NON-CONVENTIONAL METHODS
Holger Kersten, Ruben Wiese, Matthias Wolter, Mario Hannemann, Frank Scholze, Horst Neumann 14:45
[O-3-1] ADVANCED OPTIMIZATION AND PROCESS CONTROL OF PLASMA DOPING APPARATUS
Vikram Singh, Ludo Godet, Timothy Miller, George Papasouliotis, Rajesh Dorai 15:00
O-3-2] MASS SPECTROMETRY AT CHEMICALLY REACTIVE PLASMA JETS
Thomas Arnold 15:15
[O-3-3] MEASUREMENTS OF ELECTRON TEMPERATURE, AND ELECTRON DENSITY, IN AN AC PULSED CO PLASMA STUDY
Fermin Castillo, Horacio Martinez 15:30
[O-3-4] TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY IN A NON REACTIVE TITANIUM HIGH PULSE POWER MAGNETRON SPUTTERING PROCESS
Till Wallendorf, Ralf Bandorf 15:45
COFFEE BREAK
Postersession
Session 4: Semiconductors 09:00
[I-4-1] STRUCTURE AND PROPERTIES OF TiN-Ni NANOCOMPOSITE COAT-INGS DEPOSITED BY REACTIVE ION BEAM ASSISTED DEPOSITION
J. P. Riviere, A. Akbari, C. Templier, M. F.Beaufort 09:45
[O-4-1] NITROGEN ION IMPLANTATION INTO GALLIUM ARSENIDE FOR BAND GAP ENGINEERING
Marcel Risch, Michael Bradley 10:00
[O-4-2] COMPARISON OF CHEMICAL BINDING STATES BETWEEN ULTRA SHALLOW PLASMA DOPING (PD) AND ION IMPLANTATION (I/I) SAMPLES BY USING HARD X-RAY PHOTOELECTRON SPECTROSCOPY (HX-PES)
Cheng-Guo Jin, Yuichiro Sasaki, Katsumi Okashita, Bunji Mizuno, Masaaki Kobata, Eiji Ikenaga, Keisuke Kobayashi 10:15
[O-4-3] MONITORING OF ELECTRIC POTENTIAL OF SEMICONDUCTOR WAFER
Maciej A. Noras, William A. Maryniak 10:30
[O-4-4] FORMATION OF SI NANOCRYSTALS IN THE SIO2/SI INTERFACE BY PLASMA IMMERSION ION IMPLANTATION
Carina B. Mello, Mario Ueda, Antonio F. Beloto, Ursula A. Mengui 10:45
[O-4-5] MODIFICATIONS OF THE ELECTRICAL PROPERTIES OF MULTI-CRYSTALLINE SILICON BY PLASMA HYDROGENATION AND PBII FOR PHOTOVOLTAIC SOLAR CELLS
Zeinab ARAB, Luc PICHON, Alain STRABONI, Michel DROUET 11:00
COFFEE BREAK
Session 5: Modelling and Fundamentals 11:30
[O-5-1] ION IMPLANTATION INTO POLYMER-WRAPPED WEDGES: EFFECTS OF WEDGE ANGLE, PULSE LENGTH AND VOLTAGE
Richard N Tarrant, Sheila Devasahayam, Rebecca C Powles, Shoshe B Cole, Daniel Andruczyk, Duncan A Sutherland, Marcela M Bilek 11:45
[O-5-2] REACTIONS AND MOLECULAR ORGANIZATIONS IN FULLERENE FILM UNDER C60+ CLUSTER BOMBARDMENTS
Vasily Lavrentiev 12:00
[O-5-3] DEUTERIUM RETENTION NEAR SURFACE OF TIO2 BY LOW-VOLTAGE D2 PLASMA DISCHARGE
Noriaki MATSUNAMI, T. Tanaka 12:15
[I-5-1] INTRODUCTION TO MULTIPLE-GRID-PIC (PARTICLE-IN-CELL) METHOD AND ITS APPLICATION TO PLASMA IMMERSION ION IMPLANTATION (PIII) OF NITI ROD
Dixon T. K. Kwok, Xiangmei Liu, Paul K. Chu 13:00
LUNCH BREAK
Excursion to the Gardens of Dessau-Wörlitz
Conference Dinner at Püchau Castle
Session 6: Biomaterials 09:00
[I-6-1] INDUSTRIAL APPLICATION OF PIII TOWARDS VARIOUS MEDICAL DEVICES
Jan Weber 09:45
[O-6-1] BIOCOMPATIBLE DLC-COATINGS BY PBII: EFFECTS OF DOPANDS, STRUCTURE AND PLASMA ACTIVATION
Götz B Thorwarth, Thomas Wehlus, Florian P Schwarz, Walter Assmann, Bernd Stritzker 10:00
[O-6-2] PROLIFERATION AND MINERALIZATION OF OSTEOBLAST ON BIOAC-TIVE PLASMA MODIFIED NICKEL TITANIUM SHAPE MEMORY ALLOY
Roy YL Chan, Shuilin Wu, Xiangmei Lui, Paul K Chu, Kelvin WK Yeung, Alfonso HW Ngan, Kenneth MC Cheung 10:15
[O-6-3] PIII NITRIDING OF FCC-ALLOYS CONTAINING NI AND CR
Johanna Lutz, Jürgen W. Gerlach, Stephan Mändl 10:30
COFFEE BREAK
11:00
[I-6-2] BIOMATERIALS SURFACE MODIFICATION BY PLASMA BASED ION IMPLANTATION AND DEPOSITION: FROM BIOCOMPATIBLE TO BIOMIMETIC
Nan Huang 11:45
[O-6-5] THE APPLICATION OF PLASMA IMMERSION ION IMPLANTATION TO PRODUCING NOVEL BIOMATERIALS FOR BIOSENSORS AND TISSUE ENGINEERING SCAFFOLDS
Marcela M Bilek, Daniel Bax, Alexey Kondyurin, Neil Nosworthy, Bardley Steel, Joan Ho, Bee Gan 12:00
[O-6-6] NOBEL METAL NANOCLUSTER CONTAINING DIAMOND LIKE CARBON
Florian P. Schwarz, Götz Thorwarth, Thomas Wehlus, Bernd Stritzker 12:15
[O-6-7] TRIBOLOGICAL AND BIOCOMPATIBILITY BEHAVIOURS OF PLASMA IMMERSION IMPLANTED TI6AL4V ALLOY
C. Díaz, S. Mändl, J. Lutz, J. A. García, R. Martínez, R. J. Rodriguez, J. J. de Damborenea, M. A. Arenas, A. Conde 12:30
[O-6-8] OXYGEN PIII IMPROVES THE BIOACTIVITY OF TITANIUM
Belma Saldamli, Goetz Thorwarth, Stefan Maendl, Bernd Rauschenbach, Hans-Florian Zeilhofer, Robert Sader, Philipp Juergens 12:45
LUNCH BREAK
Session 7: Materials 14:00
[I-7-1] TRIBOLOGICAL PERFORMANCE OF HELIUM-IMPLANTED LAYER ON TI6AL4V ALLOY BY PLASMA-BASED ION IMPLANTATION
XinXin Ma 14:45
[O-7-2] THE EFFECT OF THE IMPLANTATION TEMPERATURE ON THE STRUCTURE OF THE IMPLANTED LAYER AND CORROSION RESISTANCE IN NITROGEN ION IMPLANTATION ZIRCALOY-4
Guoyi Tang, Wan Kim, S.J. Lee, B.H. Choi, J.H. Lee, J.G. Han 15:00
[O-7-3] OXIDATION-RESISTANT TIAL ALLOYS PRODUCED BY PLASMA IMMERSION ION IMPLANTATION OF FLUORINE
Rossen A. Yankov, Andreas Kolitsch, Mario Steinert, Alexander Donchev, Michael Schütze 15:15
COFFEE BREAK
Session 8: Carbon and Polymers 15:45
[O-8-1] MECHANICAL, MICROSTRUCTURAL AND TRIBOLOGICAL PROPERTIES OF LOW-SURFACE ENERGY DLC COATINGS USING PIID
Ronghua Wei, Chris Rincon, Mike Miller, Kent Coulter, Honbing Ji, James Arps 16:00
[O-8-2] STRUCTURES AND PROPERTIES OF DIAMOND-LIKE CARBON FILMS CONTAINING NICKEL CLUSTERS
Maziar Shakerzadeh, Peter CT Ha, Benjamin George, Zhaojun Han, Beng Kang Tay 16:15
[O-8-3] PI3D PROCESSING OF DLC COATINGS FOR DIFFERENT APPLICATIONS
Sergey A Nikiforov, Hong J Ryoo, Geun H Rim 16:30
[O-8-4] DEPOSITION AND CHARACTERIZATION OF COPPER THIN FILMS ON A POLYMER SURFACE BY USING A DC CYLINDRICAL POST MAGNETRON SPUTTERING TECHNIQUE
V. Tyagi, M. Ranjan, R. Rane, N. Vaghela, P. K. Barhai, A. Sarma, S. Mukherjee 16:45
[O-8-5] STUDY OF AG/PE INTERFACE AFTER PLASMA TREATMENT
Anna Mackova, Petr Malinsky, Jiri Bocan, Vaclav Svorcik, Jaroslav Pavlik, Zdenek Stryhal 17:00
[O-8-6] PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION OF TITANIUM NITRIDE ONTO POLYMERS
Chanokporn Chaiwong, David R. McKenzie, Marcela M.M Bilek
Session 9: Plasma and Ion Sources 09:00
[I-9-1] THE USE OF HIGH POWER IMPULSE MAGNETRON SPUTTERING FOR IMPROVED THIN FILMS AND THIN FILM PROCESSES
Ulf Helmersson, Martina Lattemann, Erik Wallin, Daniel Jädernäs 09:45
[O-9-1] GENERATION OF DROPLET-FREE HIGH-POWER PULSED SPUTTER-ING (HPPS) GLOW PLASMA WITH SEVERAL TENS OF KILOWATTS
Ken Yukimura, Ryosuke Mieda, Hiroshi Tamagaki, Tadao Okimoto 10:00
[O-9-2] PRODUCTION OF HIGH-DENSITY RF PLASMA BY CONBINATION OF-MULTI HOLLOW CATHODE DISCHARGE AND SECONDARY ELECTRON EMISSION FOR DLC COATING
Yasunori Ohtsu, Chisa Nakamura, Hiroharu Fujita, Morito Akiyama, Tatsuo Tabaru, Ken Yukimura 10:15
COFFEE BREAK
10:45
[I-9-2] DROPLET-FREE METAL ION SOURCES AND THEIR APPLICATION TO SURFACE MODIFICATION
Keiji Nakamura 11:30
[O-9-3] ION SOURCES DEVELOPMENTS AND THEIR APPLICATIONS AT IMP
Liangting Sun 11:45
[O-9-4] GASDYNAMIC ECR SOURCES OF MULTICHARGED ION BEAMS
Vladimir G. Zorin 12:00
[O-9-5] EXPENSION DYNAMICS OF PLASMA SHEATH AND APPLICATION OF PLASMA ION IMPLANTATION-DEPOSITION TO POLYMERS
Xiubo Tian, Yongxian Huang, Chunbei Wei, Jing Li, Shiqin Yang, Paul Chu, Ricky Fu 12:15
CONFERENCE SUMMARY
12:30
LUNCH BREAK
Laboratory Tour at IOM and FZD (optional)
PostersessionStart: Monday 03.09.2007 16:00 [P-1-1]
STUDY ON LOW-ENERGY SPUTTERING OF NI ATOMS INCIDENT ON NOBLE METAL (111) SURFACES BY MOLECULAR DYNAMICS SIMULATION
Zhang Qing Yu [P-1-2]
THE DEPTH PROFILE SIMULATION OF METAL IONS IMPLANTED INTO POLYMERS
Peter CT Ha, Koko K Aung, Zhao Jun Han, Maziar Shakerzadeh, Dixon TK Kwok, Beng Kang Tay [P-1-3]
EFFICIENCY OF A VENETIAN BLIND FILTER IN PBIID
Sabine Schirmer, Darina Manova, Stephan Mändl [P-1-4]
SELF-ORGANIZATION PROCESSES IN METALS BY THE IRRADIATION IN GLOW DISCHARGE PLASMA
I. V. Tereshko, V. V. Abidzina, I. E. Elkin, A. V. Khomchenko, V. V. Glushchenko, A. M. Tereshko [P-1-5]
CREATION AND ION BEAM CHARACTERIZATION OF NI-GA ULTRATHIN LAYERS ON SILICA
Vasily Lavrentiev [P-2-1]
DEVELOPMENT OF PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION SYSTEM IN SAUDI ARABIA
Ahmed M Hala [P-3-1]
EFFECT OF O2 PARTIAL PRESSURE AND SUBSTRATE TEMPERTURE ON THE PLASMA EMISSION SPECTRA AND ZNO GROWTH BEHAVIOR
Zhang Qing Yu [P-3-2]
OPTICAL EMISSION SPECTROSCOPY OF CO2 GLOW DISCHARGE AT LOW PRESSURE
Pedro G Reyes, Edgar F Mendez, Daniel Osorio, Fermin Castillo, Horacio Martinez [P-3-3]
CONVERSION PROCCESSES STUDY OF A LOW-PRESSURE GAS MIXTURE OF CO2 AND N2 BY OPTICAL EMISSION SPECTROSCOPY.
Edgar F. Méndez-Martínez, Pedro G. Reyes, Jorge López-Lemus, Fermín Castillo, Horacio Martínez [P-3-4]
LIGHT SOURCE INNER SURFACE CHANGES DEPENDING ON TREATMENT
Atis Skudra, Natalja Zorina, Zanda Gavare, Juris Silinsh, Donats Erts [P-3-5]
DISPERSION AND ABSORPTION OF LONGITUDINAL ELECTRO-KINETIC WAVES IN ION-IMPLANTED SEMICONDUCTOR PLASMAS
Preeti Thakur, Sanjay Kumar Ghosh, Nishchhal Yadav [P-4-1]
BINARY COMPOUND NANOCLUSTERS FORMATION BY MEANS OF PLASMA ION IMMERSION IMPLANTATION IN SILICA
Evgenia Valcheva, Slavcho Dimitrov, Darina Manova, Stephan Mändl [P-4-2]
IMPROVEMENT OF MICROSTRUCTURE AND DIELECTRIC PROPERTIES OF HFO2 THIN FILMS BY PLASMA IMMERSION ION NITRIDATION
A P Huang, Z S Shao, Paul K Chu [P-4-3]
LOW TEMPERATURE ATOMIC LAYER DEPOSITION OF RUTHENIUM FILM WITH RU(CO)3(C6H8) AND NH3
YongWon Song, SungHoon Chung, V Y Vasilyev, E Gorokhov [P-4-4]
ION IMPLANTATION DAMAGE IN GAN LAYERS BY AN ELLIPSOMETRIC METHOD
Mohamed BOUAFIA, Djamel BOUBETRA [P-5-1]
GOLD NANOPARTICLES EVOLUTION ON SILICA BY LOW-ENERGY ION IRRADIATION
Volha Abidzina, I. Tereshko, I. Elkin, S. Budak, C. Muntele, D. Ila [P-5-2]
EXPERIMENTAL MEASUREMENTS OF SPUTTERING YIELDS AND RANGE PARAMETERS IN GOLD THIN FILM UNDER (20 - 160) KEV AR+ IONS BOMBARDMENTS
S. Mammeri, S. Ouichaoui, H. Ammi, M. Abdesselam, A.C. Chami, R. Zemih [P-5-3]
INTERACTION OF SB+ IONS WITH SI SURFACES. STUDY OF THE IONS LATERAL DISTRIBUTION
Rebiha Labbani, Rachid Halimi [P-5-4]
ION FOCUSING OF PLASMA IMMERSION ION IMPLANTATION (PIII) WITH AN ELECTRON CYCLOTRON RESONANCE SOURCE (ECR)
Dixon T. K. Kwok, Chanokporn Chaiwong, Irina Kondyurina, Duncan A Sutherland [P-5-5]
FORMATION AND MORPHOLOGY CONTROL OF NANOSTRUCTURES PRODUCED BY PIII
Natalia Shevchenko, Jan Weber, Helfried Reuther, Andreas Kolitsch [P-5-6]
HIGHLY LOCALIZED ION FOCUSING EFFECTS IN PBII AND PBIID
Frank Haberkorn, Desislava Todorova, Darina Manova, Stephan Mändl [P-5-7]
DETERMINATION OF SECONDARY ELECTRON EMISSION COEFFICIENT (SEEC) FROM THE COLLAPSED ION SHEATH CURRENT CURVE (CISC) BY NUMERICAL CURVE FITTING
Dixon T. K. Kwok, Brian W James, Paul K Chu [P-6-1]
IN-VITRO AND IN-VIVO STUDY OF NITROGEN PLASMA IMPLANTED SHAPE MEMORY METALLIC MATERIALS
Kelvin WK Yeung, Kinon Lam, Roy YL Chan, Shuilin Wu, Xiangmei Liu, Paul K Chu, Kenneth MC Cheung [P-6-2]
PLASMA DEPOSITION TECHNIQUES OF PIEZOELECTRIC ZNO LAYERS FOR BIOCHIP APPLICATIONS
Kerstin F Wätje, Jens Ebbeke, Götz Thorwarth, Achim Wixforth [P-6-3]
CO-IMMOBILIZATION OF HEPARIN AND GELATIN ON POLYETHYLENE TEREPHTHALATE SURFACE INDUCED BY PLASMA FOR IMPROVEMENT OF ANTICOAGULATION AND ENDOTHELIALIZATION
Jingrun Ren, Jin Wang, Hong Sun, Nan Huang [P-6-4]
SURFACE CHARACTERIZATION AND IN VITRO BLOOD PLATELET BEHAVIOR OF PLASMA-POLYMERIZED ACRYLIC ACID FILMS
F. J: Jing, N. Huang, T. Tao, J. Wang, H. Sun, F. Qi, Y. X. Leng [P-6-5]
IMMOBILIZATION OF GELATIN ON TITANIUM OXIDE FILM PREPARED BY UNBALANCED MAGNETRON SPUTTERING
Y. J. Weng, F. Qi, J. Y. Cheng, Y. X. Leng, J. Wang, N. Huang [P-6-7]
IMPROVEMENT OF BLOOD COMPATIBILITY OF TITANIUM OXIDE FILM MODIFIED BY HYDROGEN PLASMA
Zhonghai YANG, Yi XU, Ping YANG, Yongxiang LENG, Nan HUANG [P-7-1]
STUDY ON TIC/FE CERMET COATINGS BY PLASMA CLADDING USING ASPHALT AS CARBONACEOUS PRECURSOR
Junbo Liu, Limei Wang, Huiqi Li, Junhai Liu [P-7-2]
HIGH DEPOSITION PREPARATION OF ZIRCONIA FILMS BY OPTIMIZA-TION OF GEOMETRY IN DUAL FREQUNCY PLASMA SPUTTERING FOR PROTECTIVE LAYER OF CERAMICS
Yasunori Ohtsu, Yuzuru Hino, Hiroharu Fujita, Morito Akiyama, Tatsuo Tabaru, Ken Yukimura [P-7-3]
INFLUENCE OF BIAS MODE ON THE ELECTROCHEMICAL CORROSION BEHAVIOR OF TIN COATED 7075 AL BY DC MAGNETRON SPUTTERING
Tian xiu bo [P-7-4]
CHARACTERIZATION OF TIN COATINGS ON THE PLASMA NITRIDED THE COMMERCIAL PURE IRON SUBSTRATES
Changzi Chen, Yongxiang Leng, Pengcheng Zhang, Bin Bai, Nan Huang [P-7-5]
INVESTIGATION ON TI-O FILM GROWTH BY FILTERED CATHODIC VACUUM ARC DEPOSITION AT VARIOUS OXYGEN PARTIAL PRESSURE
F. Qi, Yongxiang Leng, G.D. Cao, N. Huang [P-7-6]
THE PROPERTIES AND MICROSTRUCTURE OF TIN FILMS SYNTHESIZED BY CATHODIC ARC DEPOSITION
Y.P. Wu, Yongxiang Leng, N. Huang [P-7-7]
SURFACE MODIFICATION OF TI BY AN AR-O MIXTURE DC PLASMA
RAUL VALENCIA-ALVARADO, ANIBAL DE LA PIEDAD-BENEITEZ, JOSE DE LA ROSA-VAZQUEZ, REGULO LOPEZ-CALLEJAS, SAMUEL R BAROCIO, ANTONIO MERCADO-CABRERA, ROSENDO PENA-EGUILUZ [P-7-8]
PLASMA IMMERSION ION IMPLANTATION WITH AUXILIARY HEATING: APPLICATION TO SS304 STAINLESS STEEL
Mario Ueda, Alisson S. Geraldo, Carina B. Mello, Carlos M. Lepienski [P-7-9]
LOCALIZED NITRIDING BEHAVIOUR OF INDUSTRIAL COLD WORKED AUSTENITIC STEEL PARTS
Susann Heinrich, Jürgen W. Gerlach, Darina Manova, Stephan Mändl, T. Blum, P. John, Horst Neumann [P-7-10]
PHASE FORMATION, MECHANICAL PROPERTIES AND CORROSION BEHAVIOR OF BORON IMPLANTED NEAR-ALPHA TITANIUM ALLOY
Igor A Tsyganov, Andreas Kolitsch [P-7-11]
PLASMA IMMERSION ION IMPLANTATION FOR ENHANCEMENT STEEL AND METAL SURFACE HARDNESS AND CORROSION RESISTANCE
Demiral Akbar, Rasi Turan [P-8-1]
THE CORRISION RESISTANCE OF URANIUM MODIFIED WITH ION IMPLANTATION AND ION BEAM ASISTED DEPOSITION OF C
Hongwei Liang, Dongxu Yan, Bin Bai, Dingmu Lang, Hong Xiao, Xiaohong Wang [P-8-2]
MICROSTRUCTURE OF DIAMOND-LIKE CARBON FILMS PREPARED USING TOLUENE AND ACETYLENE BY BIPOLAR-TYPE PLASMA BASED ION IMPLANTATION
Setsuo Nakao, Junho Choi [P-8-3]
EFFECT OF OXYGEN PLASMA TREATMENT ON THE TRIBOLOGICAL PROPERTIES OF SI-DLC COATINGS
Junho Choi, Setsuo Nakao, Masami Ikeyama, Takahisa Kato [P-8-4]
MECHANICAL AND TRIBOLOGICAL PROPERTIES OF MULTILAYER DIAMOND-LIKE CARBON FILMS PREPARED BY FILTERED CATHODIC VACUUM ARC DEPOSITION
F Zh. Shi, H. Sun, N. Huang [P-8-5]
COMPARISON OF SURFACE LAYERS ON COPPER, TITANIUM AND TANTALUM CREATED BY METHANE PLASMA-BASED ION IMPLANTATION
Gunther Kraft, Stefan Flege, K Baba, R Hatada, Wolfgang Ensinger [P-8-6]
PERMEATION BARRIERS FOR HYDROGEN APPLICATIONS
Denis Levchuk [P-8-7]
STRUCTURAL AND OPTICAL PROPERTIES OF TITANIUM PLASMA MODIFIED POLYSTYRENE
Zhao Jun Han, Beng Kang Tay, Peter Ha, Maziar Shakerzadeh [P-8-8]
PREPARATION AND CHARACTERIZATION BEHAVIOR OF PULSED PLASMA-POLYMERIZED ALLYLAMINE FILM
Zhilu Yang, Jin Wang, Hong Sun, Nan Huang [P-8-9]
SURFACE MODIFICATION OF POLYMERS BY PLASMA-BASED ION IMPLANTATION IN SF6 PLASMAS
Ana LACOSTE, Alexandre BES, Stephane BECHU, Jacques PELLETIER [P-9-1]
HIGH-PLASMA-DENSITY HELICON SOURCE FOR PLASMA AND ION BEAM APPLICATIONS.
Serhiy M. Mordyk, Valentin I Miroshnichenko, Dmitrij A Nagornyy, Volodymyr E Storizhko [P-9-2]
A NOVEL PROCESS FOR PLASMA IMMERSION IMPLANTATION AND DEPOSITION WITH IONS FROM VAPORIZATION OF SOLID TARGETS
Rogerio M. Oliveira, Mario Ueda, Beatriz Moreno, Lilian Hoshida, Helfried Reuther, Eduardo Abramof [P-9-3]
PLASMA PERFORMANCE OF RADIO FREQUENCY HOLLOW CATHODE DISCHARGE FOR PLASMA ION IMPLANTATION OR DEPOSITION
Tian xiu bo [P-9-4]
DEVELOPMENT OF ION SOURCE WITH COLD CATHODE FOR SPUTTERING
DJAMEL BOUBETRA
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Session 1: Session 2: Session 3: Session 4: Session 5: Session 6: Session 7: Session 8: Session 9: Session 10:
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PBII&D 2007 is jointly organised by Leibniz-Institute for Surface Modification, Leipzig and Forschungszentrum Dresden Rossendorf |